SEMICONDUCTOR CHARACTERIZATION,
RELIABILITY AND FAILURE ANALYSIS


A three-day short course given
at Arizona State University


by

 

Dieter K. Schroder
Arizona State University
Tempe, AZ 85287-5706

Tel: (480) 965-6621

schroder@asu.edu

Thomas J. Shaffner
Independent Consultant
tjshaffner@earthlink.net

 


Next Course:

Not planned

Registration:

Center for Professional Development
College of Engineering and Applied Sciences
Arizona State University
P.O. Box 877506
Tempe, AZ 85287-7506

Telephone: (480) 965-1740
Fax: (480) 965-8653
E-Mail: asu.cpd@asu.edu
Internet: http://asuengineeringonline.com

The course is also available as an industrial in-house course and as a web course

This three-day intensive short course has been given at Arizona State University and at a variety of industrial and government labs. since 1982 by Dieter Schroder and Tom Shaffner, both experts in their respective fields. It is continually revised to remain up-to-date. It provides both an introduction and an update to the area of semiconductor materials and device measurements, as well as the interpretation of these measurements. It gives guidance to the choice of measurement that best fits your problem or application. Many semiconductor courses stress the theory and design of semiconductor devices and circuits, but their characterization is generally not adequately addressed. This course is designed to fill that gap. These characterization techniques are at the forefront in the development of advanced characterization methods for future applications. This is especially important today where device design, with ever decreasing dimensions and increasing performance, places continually increasing demands upon both materials and device characterization. A number of recent, new techniques have been developed but are frequently not used because people are unfamiliar with them. This issue will also be addressed.

Who Should Attend
This three-days short course is intended for engineers and managers interested in the basics and applications of current measurement tools and techniques which characterize semiconductor materials and devices and the interpretation of these measurements. It will expose the person presently engaged in semiconductor R&D, process development and manufacturing to established characterization methods, as well as recent techniques developed to meet the demand of advanced devices and materials. Some knowledge of semiconductor devices and device physics is desirable.

Benefits
* Deals exclusively with material and device characterization
* Explores the entire spectrum of semiconductor measurements
* Gives guidance in choosing the most appropriate measurement technique
* Reviews the latest techniques and interpretation of results

What You Can Expect To Learn
* Relevance of material and device characterization to the semiconductor industry
* A broad overview and perspective of relevant techniques with many application examples
* Guidance in choosing the methods that best fit your areas of interest
* Understanding of the newest techniques and their applications

COURSE OUTLINE

Electrical Characterization
* Wafer mapping - Four point probe, Eddy current, Modulated photoreflectance
* Doping profiling - Spreading resistance, Capacitance-voltage, Threshold voltage, Carrier illumination
* Lateral profiling
* Effects of series resistance
* Line width - SEM, Scatterometry, AFM, Electrical
* Mobility
* Contact resistance- Contact chain, Kelvin, TLM methods
* Device series resistance
* Schottky barrier diodes
* Threshold voltage
* Channel length, width
* IDDQ testing
* Oxide charges, Interface traps
* Charge based measurements
* Gate oxide integrity
* Hot electrons, Negative bias temperature instability
* Electromigration - Sample
* Wafer charging
* Failure analysis - Voltage contrast, Optical beam induced resistance, Liquid crystal, Emission microscopy
* Defects - Defect types, Defect sources, Deep-level transient spectroscopy, Defect etching
* Recombination/generation lifetime - Photoconductance decay, Surface photovoltage

Optical Microscopy and Spectroscopy
* Optical microscopy
* Ellipsometry
* Fourier transform infrared spectroscopy (FTIR)
* Photoluminescence spectroscopy (PL)
* Raman spectroscopy
* Acoustic microscopy

Electron Beam Microscopy (High Resolution Imaging)
* Scanning electron microscopy (SEM)
* Electron microprobe (EMP)
* Transmission electron microscopy (TEM)
* Auger electron spectroscopy (AES)
* Scanning probe microscopy (SPM)

Particle Beam Analysis (Dopants and Impurities)
* Secondary ion mass spectrometry (SIMS) - Sample
* Rutherford backscattering spectrometry (RBS)
* Neutron activation analysis (NAA)

X-ray Techniques (Contamination and Physical Defects)
* X-Ray fluorescence (XRF)
* X-Ray photoelectron spectroscopy (XPS)
* X-Ray diffraction (XRD)

Instructors
Dieter Schroder, Professor of Electrical Engineering at Arizona State University, has worked with semiconductor material and device electrical characterization for the last 30 years at the Westinghouse R&D Labs. and at Arizona State University. His current research interests are Si materials and devices, which are major thrusts of ASU's Center for Solid State Electronics Research and Center for Low Power Electronics. He has used electrical measurements in the analysis of power and MOS devices, as well as visible and infrared imaging devices. He is author of the books Advanced MOS Devices and Semiconductor Material and Device Characterization, 3rd Ed., Wiley-Interscience in 2006 and has published many papers on semiconductor characterization and device physics. He is a LifeFellow of IEEE.


Tom Shaffner, group leader of Materials Technology in the Semiconductor Electronics Division at the National Institute of Standards and Technology, has been active in characterization programs involving semiconductor and polymeric materials in industrial and academic laboratories over the past 30 years. His research interests cover a broad range of topics, including x-ray diffraction and spectroscopy, electron microscopy, techniques of surface science and methods of electron beam and x-ray lithography for microcircuit fabrication. He has lectured and published extensively in these fields and participated in the organization of regional and international materials characterization workshops and conferences. He is a past editor of Semiconductor Science and Technology, and author of the book Semiconductor Measurements and Instrumentation, published by McGraw-Hill in 1998 and many papers on semiconductor characterization.